MATEC Web Conf.
Volume 123, 20172017 The 2nd International Conference on Precision Machinery and Manufacturing Technology (ICPMMT 2017)
|Number of page(s)||6|
|Published online||21 September 2017|
Development of a XYθz 3-DOF nanopositioning stage with linear displacement amplification device
Department of Mechanical Engineering, Southern Taiwan University of Science and Technology, Tainan, Taiwan, R.O.C.
* e-mail: firstname.lastname@example.org
The main purpose of this study is to develop a XYθZ 3-DOF nanopositioning stage with linear displacement amplification device. This stage is used by three groups of linear displacement amplification device to composition, and thus achieves precise XYθZ 3-DOF movement. The linear displacement amplification device makes use of a symmetrical layer mechanism, toggle amplification mechanism and parallel guiding spring to composition, and with amplification capability. Then it uses an equilateral triangle way to set the three groups of linear displacement amplification device. Overall design uses the finite element software ANSYS 12.0 to analysis the displacement, stress and dynamic response of nanopositioning stage. Experiment demonstrated takes the laser interferometer as the standard of displacement measurement. The result of experiment measurement shows that the maximum XY axis displacement and θZ rotational angle travel of the stage is 36.5 μm, 32 μm and 265 arc sec.
© The Authors, published by EDP Sciences, 2017
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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