Open Access
Issue
MATEC Web Conf.
Volume 343, 2021
10th International Conference on Manufacturing Science and Education – MSE 2021
Article Number 02002
Number of page(s) 6
Section Management, Modelling and Monitoring of Manufacturing Processes
DOI https://doi.org/10.1051/matecconf/202134302002
Published online 04 August 2021
  1. Y. Moon, Mechanical aspects of the material removal mechanism in chemical mechanical polishing CMP (Ph.D. Dissertation, University of California at Berkeley, CA, USA 1999) [Google Scholar]
  2. J. Luo, D. A. Dornfeld, IEEE Trans. on semiconductor manuf., 14, 112 (2001) [Google Scholar]
  3. T. Deaconescu, A. Deaconescu, Materials, 13, 1343 (2020) [Google Scholar]
  4. A. Deaconescu, T. Deaconescu, Transactions of FAMENA, 39, 65 (2015) [Google Scholar]
  5. A. Deaconescu, ICBBE’17, Decision Support System Based on Robust Design Methods, (Seoul, South Korea, 2017) [Google Scholar]

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.