| Issue |
MATEC Web Conf.
Volume 67, 2016
International Symposium on Materials Application and Engineering (SMAE 2016)
|
|
|---|---|---|
| Article Number | 04013 | |
| Number of page(s) | 6 | |
| Section | Chapter 4 Surface Engineering and Coating Technology | |
| DOI | https://doi.org/10.1051/matecconf/20166704013 | |
| Published online | 29 July 2016 | |
Structural and Morphological Characteristics of Inxga1-xN Films Grown on SI (111) by Reactive Magnetron Sputtering
School of Information Science and Technology, Northwest University, Xi’an 710127, P.R. China
a E-mail address: wangxuew@nwu.edu.cn
b E-mail address: 415767417@qq.com
* Corresponding author: wangxuew@nwu.edu.cn
Under various power ratios and temperatures, Inxga1-xN films with different indium composition x were grown on Si(111) substrates by reactive magnetron sputtering, and then annealed at ammonia atmosphere around 700°C for 2 hours. The indium composition x can be adjusted by the growth temperature over the range of 600~800°C. There is no InN phase and In droplet formation in the Inxga1-xN films due to the low-temperature advantages of reactive magnetron sputtering. The rich In composition in Inxga1-xN films is caused by the higher sputtering yield of In2O3 target than Ga2O3 target. Raman scattering analysis revealed that the Inxga1-xN films obtained at different temperatures were wurtzite structure, and the compositional inhomogeneity is caused by the relaxation of momentum conservation and increase of lattice disorder.
© The Authors, published by EDP Sciences, 2016
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