MATEC Web Conf.
Volume 67, 2016International Symposium on Materials Application and Engineering (SMAE 2016)
|Number of page(s)||6|
|Section||Chapter 4 Surface Engineering and Coating Technology|
|Published online||29 July 2016|
Structural and Morphological Characteristics of Inxga1-xN Films Grown on SI (111) by Reactive Magnetron Sputtering
School of Information Science and Technology, Northwest University, Xi’an 710127, P.R. China
Under various power ratios and temperatures, Inxga1-xN films with different indium composition x were grown on Si(111) substrates by reactive magnetron sputtering, and then annealed at ammonia atmosphere around 700°C for 2 hours. The indium composition x can be adjusted by the growth temperature over the range of 600~800°C. There is no InN phase and In droplet formation in the Inxga1-xN films due to the low-temperature advantages of reactive magnetron sputtering. The rich In composition in Inxga1-xN films is caused by the higher sputtering yield of In2O3 target than Ga2O3 target. Raman scattering analysis revealed that the Inxga1-xN films obtained at different temperatures were wurtzite structure, and the compositional inhomogeneity is caused by the relaxation of momentum conservation and increase of lattice disorder.
© The Authors, published by EDP Sciences, 2016
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