MATEC Web of Conferences
Volume 8, 2013Progress in Ultrafast Laser Modifications of Materials
|Number of page(s)||2|
|Section||Application in optofluidics and in microfabrication|
|Published online||18 November 2013|
Hybrid chemical etching of femtosecond irradiated 3D structures in fused silica glass
1 Center for Nano Science and Technology@PoliMi, Istituto Italiano di Tecnologia, Via Giovanni Pascoli, 70/3, 20133, Milan, Italy
2 Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133, Milan, Italy
3 Istituto di Fotonica e Nanotecnologie – CNR, Piazza Leonardo da Vinci 32, 20133, Milan, Italy
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We report on the fabrication of 3D micro-structures in fused silica glass using chemical etching along femtosecond laser irradiated zones. In particular, we exploited a novel approach combining two different etching agents in successive steps: the hydrofluoric acid, which provides fast volume removal, and potassium hydroxide, which exhibits high selectivity. We demonstrated that this hybrid approach enables a more easy prototyping and fabrication of complex geometries for microfluidic devices.
© Owned by the authors, published by EDP Sciences, 2013
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 2.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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