MATEC Web of Conferences
Volume 8, 2013Progress in Ultrafast Laser Modifications of Materials
|Number of page(s)||2|
|Section||Advanced parallel processing through beam and temporal shaping|
|Published online||18 November 2013|
Observation of Quill Effect induced by Distortion of Spatial Beam Profile
Department of Optical Science and Technology, The University of Tokushima, Japan
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Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.
© Owned by the authors, published by EDP Sciences, 2013
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 2.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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