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Cited article:

Influence of AlxGa1−xN barrier layer thickness and p-GaN gate characteristics on the threshold voltage of p-GaN/AlGaN/GaN high electron mobility transistors

Bang-zhi Xiao, Yin-shui He and Wen-bo Xiao
AIP Advances 15 (4) (2025)
https://doi.org/10.1063/5.0250125