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Cited article:
Z.X. Chen , X. Li , W.-M. Li , G.-Q. Lo
MATEC Web of Conferences, 39 (2016) 01010
Published online: 2016-01-13
This article has been cited by the following article(s):
4 articles
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Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl4 and Metal–Organic Precursors in Horizontal Vias
Cheng-Hsuan Kuo, Aaron J. Mcleod, Ping-Che Lee, James Huang, Harshil Kashyap, Victor Wang, SeongUK Yun, Zichen Zhang, Jeffrey Spiegelman, Ravindra Kanjolia, Mansour Moinpour and Andrew C. Kummel ACS Applied Electronic Materials 5 (8) 4094 (2023) https://doi.org/10.1021/acsaelm.3c00245
Atomic layer deposition of thin films: from a chemistry perspective
Jinxiong Li, Gaoda Chai and Xinwei Wang International Journal of Extreme Manufacturing 5 (3) 032003 (2023) https://doi.org/10.1088/2631-7990/acd88e
Electron-Enhanced Atomic Layer Deposition of Titanium Nitride Films Using an Ammonia Reactive Background Gas
Zachary C. Sobell and Steven M. George Chemistry of Materials 34 (21) 9624 (2022) https://doi.org/10.1021/acs.chemmater.2c02341