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Cited article:

Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

Clémence Badie, Héloïse Tissot, Beniamino Sciacca, Maïssa K. Barr, Julien Bachmann, Christophe Vallée, Gaël Gautier, Thomas Defforge, Vincent Astie, Jean-Manuel Decams, Mikhael Bechelany and Lionel Santinacci
Journal of Vacuum Science & Technology A 41 (3) (2023)
https://doi.org/10.1116/6.0002288

Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl4 and Metal–Organic Precursors in Horizontal Vias

Cheng-Hsuan Kuo, Aaron J. Mcleod, Ping-Che Lee, James Huang, Harshil Kashyap, Victor Wang, SeongUK Yun, Zichen Zhang, Jeffrey Spiegelman, Ravindra Kanjolia, Mansour Moinpour and Andrew C. Kummel
ACS Applied Electronic Materials 5 (8) 4094 (2023)
https://doi.org/10.1021/acsaelm.3c00245

Atomic layer deposition of thin films: from a chemistry perspective

Jinxiong Li, Gaoda Chai and Xinwei Wang
International Journal of Extreme Manufacturing 5 (3) 032003 (2023)
https://doi.org/10.1088/2631-7990/acd88e

Electron-Enhanced Atomic Layer Deposition of Titanium Nitride Films Using an Ammonia Reactive Background Gas

Zachary C. Sobell and Steven M. George
Chemistry of Materials 34 (21) 9624 (2022)
https://doi.org/10.1021/acs.chemmater.2c02341