MATEC Web of Conferences
Volume 159, 2018The 2nd International Joint Conference on Advanced Engineering and Technology (IJCAET 2017) and International Symposium on Advanced Mechanical and Power Engineering (ISAMPE 2017)
|Number of page(s)||6|
|Published online||30 March 2018|
Morphology Evolution Of ZnO Thin Films Deposited By Nitrogen Mediated Crystallization Method
Computer Science Department, School of Computer Science, Bina Nusantara University, Jl. K.H. Syahdan No. 09, Palmerah, Jakarta Barat 11480, Indonesia
2 Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
* Corresponding author: email@example.com
We study the surface morphology of ZnO thin films deposited by nitrogen mediated crystallization method utilizing atomic force microscopy as a function of nitrogen flow rates. Initially, the surface morphology of ZnO thin film deposited without nitrogen exhibits a bumpy surface with spiky grains where the skewness and kurtosis values were found to be 0.48 and 4.80, respectively. By addition of small amount of nitrogen, the skewness and kurtosis values of the films significantly decrease associated with a flatter topography. Further increase in nitrogen flow rate to 16 sccm has roughened the surface shown mainly by the increase in kurtosis value to be 3.30. These results indicate that the addition of small amount of nitrogen during deposition process has enhanced the adatoms migration on the surface resulting in a superior film with a larger grain size. Two-dimensional power spectral density analysis reveals that all the films have self-affine fractal geometry with total fractal values in the range of 2.14 to above 3.00.
© The Authors, published by EDP Sciences, 2018
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (http://creativecommons.org/licenses/by/4.0/).
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