Issue |
MATEC Web Conf.
Volume 121, 2017
8th International Conference on Manufacturing Science and Education – MSE 2017 “Trends in New Industrial Revolution”
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Article Number | 03014 | |
Number of page(s) | 7 | |
Section | Advanced Manufacturing Technologies | |
DOI | https://doi.org/10.1051/matecconf/201712103014 | |
Published online | 09 August 2017 |
Generating of spatial formations composed of carbon atoms as fullerenes and nanotubes type by applying of pulsed electrical discharges to the formation of graphite films on metallic surfaces
Institutul National de Cercetare Dezvoltare pentru Chimie si Petrochimie ICECHIM Bucuresti.Bucuresti, Splaiul Independentei nr. 202, sector 6 Romania
* Corresponding author: andree_marr@yahoo.co.uk
The present paper presents the results of experimental researchings concerning the technology for obtaining the graphite films on metallic surfaces by applying the method of electric pulsed discharges (DEI). It was established that the efficiency for the graphite film obtaining is according with the conecting mode for the workpiece subjected to treatment of electric pulsed discharges to the polarity of the electric pulse generator. Thin pellicles obtained after the electric pulsed discharges treatment, contain mostly carbon, but after of detailed and special analysis (termogravimetric analyses, electronic microscopy SEM and chemical analyses), it was found that different chemical forms of carbon other of graphite are generated. They are spatial formations made of carbon atoms the type of fullerenes and carbon nanotubes. This occurance explains the special functional properties of graphite films and that is to encapsulate small molecules such as N2 in the case of fullerenes, or organic molecules in case of nanotubes with single wall.
© The Authors, published by EDP Sciences, 2017
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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