Issue |
MATEC Web Conf.
Volume 87, 2017
The 9th International Unimas Stem Engineering Conference (ENCON 2016) “Innovative Solutions for Engineering and Technology Challenges”
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Article Number | 02026 | |
Number of page(s) | 4 | |
Section | Mechanical Engineering | |
DOI | https://doi.org/10.1051/matecconf/20178702026 | |
Published online | 12 December 2016 |
Microstructural effects of banana leaf on adhesion and self cleaning behaviour
1 Department of Mechanical and Materials Engineering, Faculty of Engineering and Built Environment, Universiti Kebangsaan Malaysia, 43600 UKM Bangi, Selangor, Malaysia
2 Faculty of Engineering, Fatih University, 34500 Buyukcekmece/Istanbul / Turkey
a Corresponding author: mariyam.j.ghazali@gmail.com
A recent discovery on banana leaf that has high potential as the lotus effect has intrigued further investigation particularly on the mechanism of its self-cleaning behaviour. In this paper, the adhesive and the contact angle effects of the banana leaf, named Musa Parasidiaca L. (berangan) surface in determining the self-cleaning effect is discussed especially at high temperatures. Samples were slid against a heated metal plate at two different temperatures; 100°C and 200°C, under different loads; 0.5 kg and 1 kg. Correlation between the leaf morphologies, adhesion force and contact angles were discussed. Measurements were carefully carried out by using the various pressure scanning electron microscopy (VP-SEM), an atomic force microscope (AFM) and a drop shape analysis (DSA). The adhesion force and contact angle were decreased at the highest temperature and load. The adhesion force was found to be reduced from 5.6 nN to 1.9 nN and the value of contact angles was decreased from 108.9° to 99.4°. In short, it is hope that the new discovery of this study can shed light on its importance to mankind particularly in surface modifications for applications at higher temperature.
© The Authors, published by EDP Sciences, 2017
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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