MATEC Web Conf.
Volume 67, 2016International Symposium on Materials Application and Engineering (SMAE 2016)
|Number of page(s)||7|
|Section||Chapter 4 Surface Engineering and Coating Technology|
|Published online||29 July 2016|
SiO2 Passivation Layer Grown by Liquid Phase Deposition for N-type Bifacial Silicon Solar Cells
Institute of Solar Energy, and Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, People’s Republic of China
In this study, we fabricated n-type bifacial solar cells by liquid phase deposited (LPD) SiO2 films as surface passivation layers. We have found that the growth conditions of LPD SiO2 films have great influence on the deposition rate of the LPD SiO2 films. Besides, the surface passivation effects of LPD SiO2 films on both p-type and n-type silicon wafers are enormously improved after annealing at a temperature higher than 700 °C. Finally, the optimized LPD SiO2 films have been successfully applied to the n-type bifacial silicon solar cells as the surface passivation layers, achieving a conversion efficiency of 19.06% on a large size (156 mm×156 mm) solar cell.
Key words: Solar cell / N-type / Passivation / SiO2 / Liquid phase deposition
© The Authors, published by EDP Sciences, 2016
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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