MATEC Web of Conferences
Volume 32, 2015International Symposium of Optomechatronics Technology (ISOT 2015)
|Number of page(s)||2|
|Section||Progress in microscopy and imaging|
|Published online||02 December 2015|
An application of Mueller matrix polarimetry for characterising properties of thin film with surface roughness
1 National Cheng Kung University, Mechanical Engineering Department, Tainan 701, Taiwan
2 Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan
a Corresponding author: email@example.com
A new Mueller ellipsometry method was proposed for characterising the optical properties of thin films with rough surfaces. The validity of the proposed study is demonstrated by comparing the experimental results of the refractive index and thickness of thin film with the analytical results. Furthermore, the proposed study extracted successfully the surface roughness of thin film samples in a non contact optical manner. It provides a potential solution to replace the well-known effective approximate medium (EMA) method in dealing with the fine coarse rough surface thin film
© Owned by the authors, published by EDP Sciences, 2015
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