MATEC Web Conf.
Volume 333, 2021The 18th Asian Pacific Confederation of Chemical Engineering Congress (APCChE 2019)
|Number of page(s)||4|
|Section||Supercritical Fluid Technology|
|Published online||08 January 2021|
Practical Reuse of Activated Carbon in the Exhaust Facility of Semiconductor Production Factory with Supercritical Carbon Dioxide Regeneration
Department of Chemical Engineering, Graduate School of Engineering, Tohoku University, Aramaki Aza Aoba, 6-6-11, Aoba-Ku, Sendai, Miyagi 980-8579, Japan
2 Technical Research Laboratory, Daidan Co., Ltd., 390 Kitanagai, Miyoshimachi, Irumagun, Saitama 354-0044, Japan
3 Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University, Kagamiyama, 1-4-1, HigashiHiroshima, Hiroshima 739-8527, Japan
4 Department of Environment and Energy, Faculty of Engineering, Tohoku Institute of Technology, 35-1 Yagiyama, Kasumicho, Taihaku-Ku, Sendai, Miyagi, 982-8577, Japan
* Corresponding author: email@example.com
An possible reason why the activated carbon used in the exhaust facility of real semiconductor production factory could not be regenerated by scCO2 regeneration was estimated to be attributable to its high boiling point adsorbates which showed a peak in TGA (Thermogravimetric analysis) curve at 400-900°C. This study was conducted to experimentally verify the above insight by using TGA analysis and scCO2 regeneration for the real samples with different loads from the factory. The experimental results showed that high boiling point ratio defined by TGA analysis was less than 4.0% in case of the heating treatment temperature of 200 °C in the exhasut facility of real semiconductor production factory. This result suggested regeneration rate of the activated carbon was higher than 80%. Our scCO2 regeneration process can achieve high efficiency as a practical application.
© The Authors, published by EDP Sciences, 2021
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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