MATEC Web Conf.
Volume 92, 2017Thermophysical Basis of Energy Technologies (TBET-2016)
|Number of page(s)||3|
|Published online||21 December 2016|
Measurements of the contact angle of Noa81 photoresist for different temperatures
1 Kutateladze Institute of Thermophysics, 630090 Novosibirsk, Russia
2 Novosibirsk State University, 630090 Novosibirsk, Russia
* Corresponding author: email@example.com
In this work we study the properties of the surface, obtained by applying Noa 81 photoresist at different temperatures of the substrate. The measurement of free energy was conducted by the Owens, Wendt, Rabel and Kaelble method under isothermal conditions. The paper presents the obtained data on contact angle for different temperatures.
© The Authors, published by EDP Sciences, 2017
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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