MATEC Web Conf.
Volume 84, 2016International Symposium and School of Young Scientists “Interfacial Phenomena and Heat Transfer” (IPHT 2016)
|Number of page(s)||5|
|Published online||16 November 2016|
The effect of the channel height on the critical heat flux in a shear-driven liquid film
Institute of Thermophysics SB RAS, 1, Lavrentiev Ave, 630090, Novosibirsk, Russia
a Corresponding author: email@example.com
The fast development in semiconductor technology has led to increasingly higher chip power dissipation and greater non-uniformity of the heat dissipation with the result of localized hot spots, often exceeding 1 kW/cm2 in heat flux. As was shown in previous works of the authors, thin and very thin liquid films driven by a forced gas/vapor flow (stratified or annular flows), i.e. shear-driven liquid films in a narrow channel are promising candidate for an innovative cooling technique optimizing the tradeoffs between performance and cost. The goal of the present work is to study the effect of the channel height on the critical heat flux (CHF) in a locally heated liquid film driven by the shear stress of gas in a channel.
© The Authors, published by EDP Sciences, 2016
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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