| Issue |
MATEC Web Conf.
Volume 67, 2016
International Symposium on Materials Application and Engineering (SMAE 2016)
|
|
|---|---|---|
| Article Number | 04020 | |
| Number of page(s) | 6 | |
| Section | Chapter 4 Surface Engineering and Coating Technology | |
| DOI | https://doi.org/10.1051/matecconf/20166704020 | |
| Published online | 29 July 2016 | |
Compared to Performance of Ni / SiO2 Optical Attenuator by Two Preparing Methods
School of Materials Science and Engineering Harbin University of Science and Technology Harbin 150040, China
a tanghui6003@sina.com
* Corresponding author: tanghui6003@sina.com
In this paper, the preparation of Ni / SiO2 optical attenuator using two kinds of process, were discussed for electroless plating and magnetron sputtering technology, by analyzing Ni film appearance , surface morphology, film composition, SiO2 substrate and Ni film adhesion, known magnetron sputtering Ni film in all aspects of performance are better than electroless plating Ni film. Electroless plating Ni film quality not up to such requirements, can not be used in the practice. Conclusions: performance of Ni / SiO2 Optical Attenuator more practical and reliable by magnetron sputtering process preparing.
© The Authors, published by EDP Sciences, 2016
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