Effect of Nitrogen Flow Rate on Structure and Adhesion Strength of Magnetron Sputtered Ti-Si-N Nanocomposite Films
Liaoning Provincial Key Laboratory of Advanced Materials, Shenyang University, Shenyang 110044, China
Ti-Si-N nanocomposite films were prepared by co-sputtering Ti and Si targets in Ar/N2 gas atmosphere. The effect of N2 flow rate on the structure, adhesion strength and friction coefficient of the deposited films was studied by using X-ray diffraction, atom force microscope, field emission scanning electron microscopy and multi-functional tester for material surface properties. The Ti-Si-N films had a fine, smooth and compact structure with TiN nanograins embedded in an amorphous Si3N4 matrix. The nanocomposite films exhibited (200), (111), (220) and (222) reflections with a dominant orientation of the (200) reflection. When the N2 flow rate increased, the film structure was refined. It was found that both interfacial adhesion strength and friction coefficient depended on the N2 flow rate, and the best values were exhibited by the nanocomposite film produced at N2 flow rate of 15 sccm, perhaps contributed to a finer and smoother structure of this deposited film.
Key words: Ti-Si-N / Sputtering / Nanocomposite film / Microstructure / Adhesion strength / Friction coefficient
© The Authors, published by EDP Sciences, 2016
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