Hybrid chemical etching of femtosecond irradiated 3D structures in fused silica glass
1 Center for Nano Science and Technology@PoliMi, Istituto Italiano di Tecnologia, Via Giovanni Pascoli, 70/3, 20133, Milan, Italy
2 Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133, Milan, Italy
3 Istituto di Fotonica e Nanotecnologie – CNR, Piazza Leonardo da Vinci 32, 20133, Milan, Italy
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We report on the fabrication of 3D micro-structures in fused silica glass using chemical etching along femtosecond laser irradiated zones. In particular, we exploited a novel approach combining two different etching agents in successive steps: the hydrofluoric acid, which provides fast volume removal, and potassium hydroxide, which exhibits high selectivity. We demonstrated that this hybrid approach enables a more easy prototyping and fabrication of complex geometries for microfluidic devices.
© Owned by the authors, published by EDP Sciences, 2013
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